Single Layer Growth of Strained Epitaxy at Low Temperature


Autoria(s): Duan Ruifei; Wang Baoqiang; Zhu Zhanping; Zeng Yiping
Data(s)

2003

Resumo

Contacting mode atomic force microscopy (AFM) is used to measure the In0.asGao.65As/GaAs epilayer grown at low temperature (460°C). Unlike the normal layer-by-layer growth (FvdM mode) or self-organized islands growth (SK mode) ,samples grown under 460 C are found to be large islands with atomic thick terraces. AFM measurements reveale near one monolayer high steps. This kind of growth is good between FvdM and SK growth modes and can be used to understand the evolution of strained epitaxy from FvdM to SK mode.

Identificador

http://ir.semi.ac.cn/handle/172111/17719

http://www.irgrid.ac.cn/handle/1471x/103497

Idioma(s)

英语

Fonte

Duan Ruifei;Wang Baoqiang;Zhu Zhanping;Zeng Yiping.Single Layer Growth of Strained Epitaxy at Low Temperature,半导体学报,2003,24(4):362-365

Palavras-Chave #半导体材料
Tipo

期刊论文