Wet Oxidation of AlxGa1-xAs/GaAs Distributed Bragg Reflectors


Autoria(s): Li Yuoyuan; Wang Zhanguo; Xu Bo; Jin Peng; Zhang Chunling; Guo Xia; Chen Min
Data(s)

2005

Resumo

The wet oxidation of AlGaAs with high Al content in a distributed Bragg reflectors (DBR) is studied by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Some voids distribute along the oxide/GaAs interfaces due to the stress induced by the wet oxidation of the AlGaAs layers. These voids decrease the shrinkage of the Al2O3 layers to 8% instead of the theoretical 20% when compared to the unoxidized AlGaAs layers. With the extension of oxidation time, the reactants are more completely transported to the front interface and the products are more completely transported out along the porous interfaces. As a result,the oxide quality is better.

国家重点基础研究发展计划,国家自然科学基金

Identificador

http://ir.semi.ac.cn/handle/172111/16923

http://www.irgrid.ac.cn/handle/1471x/103099

Idioma(s)

英语

Fonte

Li Yuoyuan;Wang Zhanguo;Xu Bo;Jin Peng;Zhang Chunling;Guo Xia;Chen Min.Wet Oxidation of AlxGa1-xAs/GaAs Distributed Bragg Reflectors,半导体学报,2005,26(8):1519-1523

Palavras-Chave #半导体材料
Tipo

期刊论文