Low -temperature preparation of ZnO films on Si substrates by MOCVD


Autoria(s): SHEN Wenjuan; Wang Jun; Wang Qiyuan; Duan Yao; Zeng Yiping
Data(s)

2006

Resumo

ZnO films were deposited on Si(100) substrates at 300℃ by metal - organic chemical vapor deposition(MOCVD). The effect of different ratios of DEZn to N2O on crystal quality was analyzed. It is found that the optimum ratio of DEZn to N2O is 2.1. And in this optimum growth condition, X - ray diffraction (XRD) and scanning probe morphology (SPM) images indicate that the films grow along the c - axis orientation. ZnO film exhibits a strong UV optical absorption near 388 nm. And the optical absorbance is close to zero,that indicates nearly 100% optical transparence. Photoluminescence (PL) spectrum shows only strong near - band - edge emissions with little or no deep - level emission related to defects. The full - width at half - maximum (FWHM) of the ultraviolet emission peak is 80meV. The results indicate that better crystal quality can be obtained.

ZnO films were deposited on Si(100) substrates at 300℃ by metal - organic chemical vapor deposition(MOCVD). The effect of different ratios of DEZn to N2O on crystal quality was analyzed. It is found that the optimum ratio of DEZn to N2O is 2.1. And in this optimum growth condition, X - ray diffraction (XRD) and scanning probe morphology (SPM) images indicate that the films grow along the c - axis orientation. ZnO film exhibits a strong UV optical absorption near 388 nm. And the optical absorbance is close to zero,that indicates nearly 100% optical transparence. Photoluminescence (PL) spectrum shows only strong near - band - edge emissions with little or no deep - level emission related to defects. The full - width at half - maximum (FWHM) of the ultraviolet emission peak is 80meV. The results indicate that better crystal quality can be obtained.

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Materials Center, Institute of Semiconductors, Chinese Academy of Science

Identificador

http://ir.semi.ac.cn/handle/172111/16691

http://www.irgrid.ac.cn/handle/1471x/102983

Idioma(s)

英语

Fonte

SHEN Wenjuan;Wang Jun;Wang Qiyuan;Duan Yao;Zeng Yiping.Low -temperature preparation of ZnO films on Si substrates by MOCVD,功能材料与器件学报,2006,12(1):63-66

Palavras-Chave #半导体材料
Tipo

期刊论文