Low -temperature preparation of ZnO films on Si substrates by MOCVD
Data(s) |
2006
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Resumo |
ZnO films were deposited on Si(100) substrates at 300℃ by metal - organic chemical vapor deposition(MOCVD). The effect of different ratios of DEZn to N2O on crystal quality was analyzed. It is found that the optimum ratio of DEZn to N2O is 2.1. And in this optimum growth condition, X - ray diffraction (XRD) and scanning probe morphology (SPM) images indicate that the films grow along the c - axis orientation. ZnO film exhibits a strong UV optical absorption near 388 nm. And the optical absorbance is close to zero,that indicates nearly 100% optical transparence. Photoluminescence (PL) spectrum shows only strong near - band - edge emissions with little or no deep - level emission related to defects. The full - width at half - maximum (FWHM) of the ultraviolet emission peak is 80meV. The results indicate that better crystal quality can be obtained. ZnO films were deposited on Si(100) substrates at 300℃ by metal - organic chemical vapor deposition(MOCVD). The effect of different ratios of DEZn to N2O on crystal quality was analyzed. It is found that the optimum ratio of DEZn to N2O is 2.1. And in this optimum growth condition, X - ray diffraction (XRD) and scanning probe morphology (SPM) images indicate that the films grow along the c - axis orientation. ZnO film exhibits a strong UV optical absorption near 388 nm. And the optical absorbance is close to zero,that indicates nearly 100% optical transparence. Photoluminescence (PL) spectrum shows only strong near - band - edge emissions with little or no deep - level emission related to defects. The full - width at half - maximum (FWHM) of the ultraviolet emission peak is 80meV. The results indicate that better crystal quality can be obtained. 于2010-11-23批量导入 zhangdi于2010-11-23 13:03:21导入数据到SEMI-IR的IR Made available in DSpace on 2010-11-23T05:03:21Z (GMT). No. of bitstreams: 1 4302.pdf: 424702 bytes, checksum: c45a35825852f55580cb62721b5473cc (MD5) Previous issue date: 2006 Materials Center, Institute of Semiconductors, Chinese Academy of Science |
Identificador | |
Idioma(s) |
英语 |
Fonte |
SHEN Wenjuan;Wang Jun;Wang Qiyuan;Duan Yao;Zeng Yiping.Low -temperature preparation of ZnO films on Si substrates by MOCVD,功能材料与器件学报,2006,12(1):63-66 |
Palavras-Chave | #半导体材料 |
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期刊论文 |