MOCVD-Grown AlGaN/AlN/GaN HEMT Structure with High Mobility GaN Thin Layer as Channel on SiC


Autoria(s): Wang Xiaoliang; Hu Guoxin; Ma Zhiyong; Xiao Hongling; Wang Cuimei; Luo Weijun; Liu Xinyu; Chen Xiaojuan; Li Jianping; Li Jinmin; Qian He; Wang Zhanguo
Data(s)

2006

Resumo

AlGaN/AlN/GaN high electron mobility transistor (HEMT) structures with a high-mobility GaN thin layer as a channel are grown on high resistive 6H-SiC substrates by metalorganic chemical vapor deposition. The HEMT structure exhibits a typical two-dimensional electron gas (2DEG) mobility of 1944cm2/(V · s) at room temperature and 11588cm2/(V· s) at 80K with almost equal 2DEG concentrations of about 1.03 × 1013 cm-2 High crystal quality of the HEMT structures is confirmed by triple-crystal X-ray diffraction analysis. Atomic force microscopy measurements reveal a smooth AlGaN surface with a root-mean-square roughness of 0. 27nm for a scan area of 10μm × 10μm. HEMT devices with 0.8μm gate length and 1.2mm gate width are fabricated using the structures. A maximum drain current density of 957mA/mm and an extrinsic transconductance of 267mS/mm are obtained.

AlGaN/AlN/GaN high electron mobility transistor (HEMT) structures with a high-mobility GaN thin layer as a channel are grown on high resistive 6H-SiC substrates by metalorganic chemical vapor deposition. The HEMT structure exhibits a typical two-dimensional electron gas (2DEG) mobility of 1944cm2/(V · s) at room temperature and 11588cm2/(V· s) at 80K with almost equal 2DEG concentrations of about 1.03 × 1013 cm-2 High crystal quality of the HEMT structures is confirmed by triple-crystal X-ray diffraction analysis. Atomic force microscopy measurements reveal a smooth AlGaN surface with a root-mean-square roughness of 0. 27nm for a scan area of 10μm × 10μm. HEMT devices with 0.8μm gate length and 1.2mm gate width are fabricated using the structures. A maximum drain current density of 957mA/mm and an extrinsic transconductance of 267mS/mm are obtained.

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中国科学院知识创新工程重要方向性项目,国家自然科学基金,国家重点基础研究发展规划,国家高技术研究发展计划资助项目

Institute of Semiconductors, Chinese Academy of Sciences;Institute of Microelectronics, Chinese Academy of Sciences

中国科学院知识创新工程重要方向性项目,国家自然科学基金,国家重点基础研究发展规划,国家高技术研究发展计划资助项目

Identificador

http://ir.semi.ac.cn/handle/172111/16601

http://www.irgrid.ac.cn/handle/1471x/102938

Idioma(s)

英语

Fonte

Wang Xiaoliang;Hu Guoxin;Ma Zhiyong;Xiao Hongling;Wang Cuimei;Luo Weijun;Liu Xinyu;Chen Xiaojuan;Li Jianping;Li Jinmin;Qian He;Wang Zhanguo.MOCVD-Grown AlGaN/AlN/GaN HEMT Structure with High Mobility GaN Thin Layer as Channel on SiC,半导体学报,2006,27(9):1521-1525

Palavras-Chave #半导体材料
Tipo

期刊论文