MOCVD-Grown AlGaN/AlN/GaN HEMT Structure with High Mobility GaN Thin Layer as Channel on SiC
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2006
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AlGaN/AlN/GaN high electron mobility transistor (HEMT) structures with a high-mobility GaN thin layer as a channel are grown on high resistive 6H-SiC substrates by metalorganic chemical vapor deposition. The HEMT structure exhibits a typical two-dimensional electron gas (2DEG) mobility of 1944cm2/(V · s) at room temperature and 11588cm2/(V· s) at 80K with almost equal 2DEG concentrations of about 1.03 × 1013 cm-2 High crystal quality of the HEMT structures is confirmed by triple-crystal X-ray diffraction analysis. Atomic force microscopy measurements reveal a smooth AlGaN surface with a root-mean-square roughness of 0. 27nm for a scan area of 10μm × 10μm. HEMT devices with 0.8μm gate length and 1.2mm gate width are fabricated using the structures. A maximum drain current density of 957mA/mm and an extrinsic transconductance of 267mS/mm are obtained. AlGaN/AlN/GaN high electron mobility transistor (HEMT) structures with a high-mobility GaN thin layer as a channel are grown on high resistive 6H-SiC substrates by metalorganic chemical vapor deposition. The HEMT structure exhibits a typical two-dimensional electron gas (2DEG) mobility of 1944cm2/(V · s) at room temperature and 11588cm2/(V· s) at 80K with almost equal 2DEG concentrations of about 1.03 × 1013 cm-2 High crystal quality of the HEMT structures is confirmed by triple-crystal X-ray diffraction analysis. Atomic force microscopy measurements reveal a smooth AlGaN surface with a root-mean-square roughness of 0. 27nm for a scan area of 10μm × 10μm. HEMT devices with 0.8μm gate length and 1.2mm gate width are fabricated using the structures. A maximum drain current density of 957mA/mm and an extrinsic transconductance of 267mS/mm are obtained. 于2010-11-23批量导入 zhangdi于2010-11-23 13:02:56导入数据到SEMI-IR的IR Made available in DSpace on 2010-11-23T05:02:56Z (GMT). No. of bitstreams: 1 4254.pdf: 572469 bytes, checksum: f55d678375bd03c5a76b8ff1167052f1 (MD5) Previous issue date: 2006 中国科学院知识创新工程重要方向性项目,国家自然科学基金,国家重点基础研究发展规划,国家高技术研究发展计划资助项目 Institute of Semiconductors, Chinese Academy of Sciences;Institute of Microelectronics, Chinese Academy of Sciences 中国科学院知识创新工程重要方向性项目,国家自然科学基金,国家重点基础研究发展规划,国家高技术研究发展计划资助项目 |
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英语 |
Fonte |
Wang Xiaoliang;Hu Guoxin;Ma Zhiyong;Xiao Hongling;Wang Cuimei;Luo Weijun;Liu Xinyu;Chen Xiaojuan;Li Jianping;Li Jinmin;Qian He;Wang Zhanguo.MOCVD-Grown AlGaN/AlN/GaN HEMT Structure with High Mobility GaN Thin Layer as Channel on SiC,半导体学报,2006,27(9):1521-1525 |
Palavras-Chave | #半导体材料 |
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期刊论文 |