Layout Design and Optimization of RF Spiral Inductors on Silicon Substrate


Autoria(s): Xue Chunlai; Yao Fei; Chen Buwen; Wang Qiming
Data(s)

2006

Resumo

The effects of key geometrical parameters on the performance of integrated spiral inductors are investigated with the 3D electromagnetic simulator HFSS. While varying geometrical parameters such as the number of turns (N),the width of the metal traces (W),the spacing between the traces (S),and the inner diameter (ID), changes in the performance of the inductors are analyzed in detail. The reasons for these changes in performance are presented. Simulation results indicate that the performance of an integrated spiral inductor can be improved by optimizing its layout. Some design rules are summarized.

The effects of key geometrical parameters on the performance of integrated spiral inductors are investigated with the 3D electromagnetic simulator HFSS. While varying geometrical parameters such as the number of turns (N),the width of the metal traces (W),the spacing between the traces (S),and the inner diameter (ID), changes in the performance of the inductors are analyzed in detail. The reasons for these changes in performance are presented. Simulation results indicate that the performance of an integrated spiral inductor can be improved by optimizing its layout. Some design rules are summarized.

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国家高技术研究发展计划,国家重点基础研究发展规划,国家自然科学基金资助项目

Institute of Semiconductors Chinese Academy of Sciences

国家高技术研究发展计划,国家重点基础研究发展规划,国家自然科学基金资助项目

Identificador

http://ir.semi.ac.cn/handle/172111/16503

http://www.irgrid.ac.cn/handle/1471x/102889

Idioma(s)

英语

Fonte

Xue Chunlai;Yao Fei;Chen Buwen;Wang Qiming.Layout Design and Optimization of RF Spiral Inductors on Silicon Substrate,半导体学报,2006,27(5):769-773

Palavras-Chave #光电子学
Tipo

期刊论文