Layout Design and Optimization of RF Spiral Inductors on Silicon Substrate
Data(s) |
2006
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Resumo |
The effects of key geometrical parameters on the performance of integrated spiral inductors are investigated with the 3D electromagnetic simulator HFSS. While varying geometrical parameters such as the number of turns (N),the width of the metal traces (W),the spacing between the traces (S),and the inner diameter (ID), changes in the performance of the inductors are analyzed in detail. The reasons for these changes in performance are presented. Simulation results indicate that the performance of an integrated spiral inductor can be improved by optimizing its layout. Some design rules are summarized. The effects of key geometrical parameters on the performance of integrated spiral inductors are investigated with the 3D electromagnetic simulator HFSS. While varying geometrical parameters such as the number of turns (N),the width of the metal traces (W),the spacing between the traces (S),and the inner diameter (ID), changes in the performance of the inductors are analyzed in detail. The reasons for these changes in performance are presented. Simulation results indicate that the performance of an integrated spiral inductor can be improved by optimizing its layout. Some design rules are summarized. 于2010-11-23批量导入 zhangdi于2010-11-23 13:02:37导入数据到SEMI-IR的IR Made available in DSpace on 2010-11-23T05:02:37Z (GMT). No. of bitstreams: 1 4182.pdf: 484885 bytes, checksum: d6e33829c7297092abfccdca1b387f3a (MD5) Previous issue date: 2006 国家高技术研究发展计划,国家重点基础研究发展规划,国家自然科学基金资助项目 Institute of Semiconductors Chinese Academy of Sciences 国家高技术研究发展计划,国家重点基础研究发展规划,国家自然科学基金资助项目 |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Xue Chunlai;Yao Fei;Chen Buwen;Wang Qiming.Layout Design and Optimization of RF Spiral Inductors on Silicon Substrate,半导体学报,2006,27(5):769-773 |
Palavras-Chave | #光电子学 |
Tipo |
期刊论文 |