DCXRD Investigation of a Ge/Si(001) Island Multilayer Structure


Autoria(s): Shi Wenhua; Xue Chunlai; Luo Liping; Wang Qiming
Data(s)

2007

Resumo

A Ge/Si(001) island multilayer structure is investigated by double crystal X-ray diffraction, transmission electron microscopy,and atomic force microscopy. We fit the satellite peaks in the rocking curve by two Lorentz lineshapes, which originate from the wetting layer region and the island region. Then from the ratio of the thick- nesses of the Si and Ge (GeSi) layers as determined by TEM,tbe Ge compositions of the wetting layer and islands are estimated to be about 0. 51 and 0. 67, respectively,according to the positions of the fitted peaks. This proves to be a relatively simple way to investigate the Ge/Si (001) island multilayer structure.

国家重点基础研究发展规划,国家自然科学基金

Identificador

http://ir.semi.ac.cn/handle/172111/16361

http://www.irgrid.ac.cn/handle/1471x/102219

Idioma(s)

英语

Fonte

Shi Wenhua;Xue Chunlai;Luo Liping;Wang Qiming.DCXRD Investigation of a Ge/Si(001) Island Multilayer Structure,半导体学报,2007,28(2):145-148

Palavras-Chave #光电子学
Tipo

期刊论文