Characterization of Phosphorus Diffused ZnO Bulk Single Crystals


Autoria(s): Zhang Rui; Zhang Fan; Zhao Youwen; Dong Zhiyuan; Yang Jun
Data(s)

2008

Resumo

Phosphorus was diffused into CVT grown undoped ZnO bulk single crystals at 550 and 800℃ in a closed quartz tube. The P-diffused ZnO single crystals were characterized by the Hall effect, X-ray photoelectron spectroscopy (XPS), photoluminescence spectroscopy (PL), and Raman scattering. The P-diffused ZnO single crystals are n-type and have higher free electron concentration than undoped ZnO, especially for the sample diffused at 800℃. The PL measurement reveals defect related visible broad emissions in the range of 420-550nm in the P-diffused ZnO samples. The XPS result suggests that most of the P atoms substitute in the Zn site after they diffuse into the ZnO single crystal at 550℃ ,while the P atom seems to occupy the O site in the ZnO samples diffused at 800℃. A high concentration of shallow donor defect forms in the P-diffused ZnO,resulting in an apparent increase of free electron concentration.

国家自然科学基金资助项目(批准号

Identificador

http://ir.semi.ac.cn/handle/172111/15959

http://www.irgrid.ac.cn/handle/1471x/102018

Idioma(s)

英语

Fonte

Zhang Rui;Zhang Fan;Zhao Youwen;Dong Zhiyuan;Yang Jun.Characterization of Phosphorus Diffused ZnO Bulk Single Crystals,半导体学报,2008,29(9):1674-1678

Palavras-Chave #半导体材料
Tipo

期刊论文