BREAKING UP OF MISFIT DISLOCATIONS IN GAASIN0.3GA0.7AS/GAAS HETEROSTRUCTURE


Autoria(s): WU J; LI W; FAN TW; WANG ZG; DUAN XF
Data(s)

1995

Resumo

The effect of GaAs cap layer with different thicknesses in the GaAs/In0.3Ga0.7As/GaAs heterostructure on misfit dislocation is investigated with transmission electron microscopy, and it is found that lines of misfit dislocation break up and move out of the structure when the GaAs cap layer thickness exceeds a certain amount. The breaking up and moving out of misfit dislocations, initially confined in the (001) substrate/InGaAs epilayer interface, occur mainly along the [110] direction on the interface in the structure. (C) 1995 American Institute of Physics.

Identificador

http://ir.semi.ac.cn/handle/172111/15519

http://www.irgrid.ac.cn/handle/1471x/101798

Idioma(s)

英语

Fonte

WU J; LI W; FAN TW; WANG ZG; DUAN XF .BREAKING UP OF MISFIT DISLOCATIONS IN GAASIN0.3GA0.7AS/GAAS HETEROSTRUCTURE ,APPLIED PHYSICS LETTERS ,1995,67(6):846-847

Palavras-Chave #半导体材料 #RELAXATION
Tipo

期刊论文