GROWTH INTERRUPTION INDUCED INTERFACE MICROROUGHNESS IN SINGLE QUANTUM-WELLS
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1995
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Resumo |
Growth interruption-induced microroughness is studied by photoluminescence (PL) of single quantum wells with different well widths and interruption times. Analysis of the peak splitting in the PL spectra shows that the adjacent peak splittings correspond to well width differences smaller than one monolayer. The number of split peaks increases with increasing well width, saturating when the well width exceeds 11 monolayers. This trend correlates well with the decrease in the lateral dimension of the exciton, which corresponds roughly to the minimum optically sampled area of the interface. For a given quantum well, a plot of the normalized integrated intensities of the split PL peaks versus the well width fluctuation is well described by a Gaussian distribution with an average fluctuation smaller than one monolayer. These results are consistent with the microroughness model. Growth interruption-induced microroughness is studied by photoluminescence (PL) of single quantum wells with different well widths and interruption times. Analysis of the peak splitting in the PL spectra shows that the adjacent peak splittings correspond to well width differences smaller than one monolayer. The number of split peaks increases with increasing well width, saturating when the well width exceeds 11 monolayers. This trend correlates well with the decrease in the lateral dimension of the exciton, which corresponds roughly to the minimum optically sampled area of the interface. For a given quantum well, a plot of the normalized integrated intensities of the split PL peaks versus the well width fluctuation is well described by a Gaussian distribution with an average fluctuation smaller than one monolayer. These results are consistent with the microroughness model. 于2010-11-17批量导入 zhangdi于2010-11-17 14:17:05导入数据到SEMI-IR的IR Made available in DSpace on 2010-11-17T06:17:05Z (GMT). No. of bitstreams: 1 7080.pdf: 290182 bytes, checksum: 6bf01496a86f00dbff9db7d4f0405e58 (MD5) Previous issue date: 1995 ACAD SINICA,INST SEMICOND,NATL LAB SUPERLATTICES & MICROSTRUCT,BEIJING 100083,PEOPLES R CHINA |
Identificador | |
Idioma(s) |
英语 |
Fonte |
LUO CP; CHIN MK; YUAN Z; XU ZY; YANG XP; ZHANG PH .GROWTH INTERRUPTION INDUCED INTERFACE MICROROUGHNESS IN SINGLE QUANTUM-WELLS ,JOURNAL OF CRYSTAL GROWTH,1995,155(0):272-275 |
Palavras-Chave | #半导体材料 #SEMICONDUCTOR INTERFACES #ROUGHNESS SCATTERING |
Tipo |
期刊论文 |