ALKALINE POLISHING OF INP USING DOUBLE-POURING TECHNIQUE


Autoria(s): WEI JA
Data(s)

1995

Resumo

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Institute of semiconductors,CAS

Identificador

http://ir.semi.ac.cn/handle/172111/15487

http://www.irgrid.ac.cn/handle/1471x/101782

Idioma(s)

英语

Fonte

WEI JA .ALKALINE POLISHING OF INP USING DOUBLE-POURING TECHNIQUE ,CRYSTAL RESEARCH AND TECHNOLOGY ,1995,30(7):K69-K72

Palavras-Chave #半导体材料
Tipo

期刊论文