Dislocations and precipitates in semi-insulating gallium arsenide revealed by ultrasonic Abrahams-Buiocchi etching


Autoria(s): Chen NF; He HJ; Wang YT; Pan K; Lin LY
Data(s)

1996

Resumo

The dislocations and precipitates in SI-GaAs single crystals are revealed by ultrasonic-aided Abrahams-Buiocchi etching (USAB), and the etch pits are observed and measured by metalloscope and scanning electron microscope (SEM) equipped with an energy dispersive X-ray spectrometer (EDS), respectively. The size of etch pit revealed by USAB etching is about 1 order of magnitude smaller than that revealed by molten KOH. The amount of arsenic atoms in the dislocation-dense zone is about 1% larger than that in an adjacent dislocation-free zone measured by EDS attached to SEM, which indicates that the excess arsenic atoms adjacent to the dislocation-dense zone are attracted to the dislocations and precipitate there due to the deformation energy.

Identificador

http://ir.semi.ac.cn/handle/172111/15345

http://www.irgrid.ac.cn/handle/1471x/101711

Idioma(s)

英语

Fonte

Chen NF; He HJ; Wang YT; Pan K; Lin LY .Dislocations and precipitates in semi-insulating gallium arsenide revealed by ultrasonic Abrahams-Buiocchi etching ,JOURNAL OF CRYSTAL GROWTH,1996,167(0):766-768

Palavras-Chave #半导体材料 #GAAS
Tipo

期刊论文