Characterization of deep centers in AlGaAs/InGaAs/GaAs pseudomorphic HEMT structures grown by molecular beam epitaxy and hydrogen treatment


Autoria(s): Lu LW; Feng SL; Liang JB; Wang ZG; Wang J; Wang Y; Ge WK
Data(s)

1996

Resumo

In AlGaAs/InGaAs/GaAs PM-HEMT structures, the characterization of deep centers, the degradation in electrical and optical properties and their effects on electrical performance of the PM-HEMTs have been investigated by DLTS, SIMS, PL and conventional van der Pauw techniques. The experimental results confirm that the deep level centers correlate strongly with the oxygen content in the AlGaAs layer, the PL response of PM-HEMTs, and the electrical performance of the PM-HEMTs. Hydrogen plasma treatment was used to passivate/annihilate these centers, and the effects of hydrogenation were examined.

Identificador

http://ir.semi.ac.cn/handle/172111/15309

http://www.irgrid.ac.cn/handle/1471x/101693

Idioma(s)

英语

Fonte

Lu LW; Feng SL; Liang JB; Wang ZG; Wang J; Wang Y; Ge WK .Characterization of deep centers in AlGaAs/InGaAs/GaAs pseudomorphic HEMT structures grown by molecular beam epitaxy and hydrogen treatment ,JOURNAL OF CRYSTAL GROWTH,1996,169(4):637-642

Palavras-Chave #半导体材料 #ALXGA1-XAS #TRENDS
Tipo

期刊论文