Stoichiometric defects in semi-insulating GaAs


Autoria(s): Chen NF; He HJ; Wang YT; Lin LY
Data(s)

1997

Resumo

The influences of arsenic interstitials and dislocations on the lattice parameters of undoped semi-insulating (SI) GaAs single crystals were analyzed. It was shown that the dislocations in such crystals serve as effective gettering sites for arsenic interstitials due to the deformation energy of dislocations. The average excess arsenic in GaAs epilayers grown by molecular-beam epitaxy (MBE) at low temperatures (LT) is about 1%, and the lattice parameters of these epilayers are larger than those of liquid-encapsulated Czochralski-grown (LEG) SI-GaAs by about 0.1%. The atomic ratio, [As]/([Ga] + [As]), in SI-GaAs grown by low-pressure (LP) LEC is the nearest to the strict stoichiometry compared with those grown by high-pressure (HP) LEC and vertical gradient freeze (VGF). After multiple wafer annealing (MWA), the crystals grown by HPLEC become closer to be strictly stoichiometric.

Identificador

http://ir.semi.ac.cn/handle/172111/15203

http://www.irgrid.ac.cn/handle/1471x/101496

Idioma(s)

英语

Fonte

Chen NF; He HJ; Wang YT; Lin LY .Stoichiometric defects in semi-insulating GaAs ,JOURNAL OF CRYSTAL GROWTH,1997,173(0):325-329

Palavras-Chave #半导体材料 #MOLECULAR-BEAM EPITAXY
Tipo

期刊论文