MBE of GaN with DC-plasma source for nitrogen activation


Autoria(s): Novikov SV; Kipshidze GD; Lebedev VB; Sharonova LV; Shik AY; Tretyakov VV; Jmerik VN; Kuznetsov VM; Gurevich AM; Zinovev NN; Foxon CT; Cheng TS; Ren GB
Data(s)

1997

Resumo

In this paper we report on the first results of epitaxial growth of GaN layers on GaAs (100) substrates using a modified MBE system, equipped with a DC-plasma source for nitrogen activation in configuration of reverse magnetron at ultra-low pressures.

Identificador

http://ir.semi.ac.cn/handle/172111/15179

http://www.irgrid.ac.cn/handle/1471x/101484

Idioma(s)

英语

Fonte

Novikov SV; Kipshidze GD; Lebedev VB; Sharonova LV; Shik AY; Tretyakov VV; Jmerik VN; Kuznetsov VM; Gurevich AM; Zinovev NN; Foxon CT; Cheng TS; Ren GB .MBE of GaN with DC-plasma source for nitrogen activation ,COMPOUND SEMICONDUCTORS 1996,1997,(155):255-258

Palavras-Chave #半导体材料 #NITRIDES #GROWTH
Tipo

期刊论文