Strong visible photoluminescence from amorphous silicon grains in a-SiOx:H films


Autoria(s): Ma ZX; Liao XB; He J; Yue GZ; Wang YQ; Cheng WC; Kong GL
Data(s)

1997

Resumo

Two strong luminescence bands were observed from a-SiOx:H in the spectral range of 550-900 nm at room temperature. One is a main broad peak which blueshifts with oxygen content and the other is a shoulder fixed at about 835 nm. In conjunction with TR and micro-Raman spectra, we have proposed that the main band may originate from the amorphous silicon grains embedded in SiOx network, while the shoulder might be due to some defects induced by excess-silicon in these films. (C) 1997 Elsevier Science Ltd.

Identificador

http://ir.semi.ac.cn/handle/172111/15113

http://www.irgrid.ac.cn/handle/1471x/101451

Idioma(s)

英语

Fonte

Ma ZX; Liao XB; He J; Yue GZ; Wang YQ; Cheng WC; Kong GL .Strong visible photoluminescence from amorphous silicon grains in a-SiOx:H films ,SOLID STATE COMMUNICATIONS,1997,104(10):587-591

Palavras-Chave #半导体物理 #disordered system #optical properties #luminescence #POROUS SILICON #MATRIX #DOTS
Tipo

期刊论文