THE CHARACTERISTICS OF OXIDATION OF POLYCRYSTALLINE SILICON FILMS IN VLSI
| Data(s) |
1984
|
|---|---|
| Identificador | |
| Idioma(s) |
英语 |
| Fonte |
WANG YY; ZHANG AZ.THE CHARACTERISTICS OF OXIDATION OF POLYCRYSTALLINE SILICON FILMS IN VLSI,PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS,1984,463(0):139-145 |
| Palavras-Chave | #光电子学 |
| Tipo |
期刊论文 |
