THE CONVERGENT EFFECT OF THE ANNEALING TEMPERATURES OF ELECTRON-IRRADIATED DEFECTS IN FZ SILICON GROWN IN HYDROGEN


Autoria(s): QIN GG; HUA ZL
Data(s)

1985

Identificador

http://ir.semi.ac.cn/handle/172111/14759

http://www.irgrid.ac.cn/handle/1471x/101414

Idioma(s)

英语

Fonte

QIN GG; HUA ZL.THE CONVERGENT EFFECT OF THE ANNEALING TEMPERATURES OF ELECTRON-IRRADIATED DEFECTS IN FZ SILICON GROWN IN HYDROGEN,SOLID STATE COMMUNICATIONS ,1985,53(11):975-978

Palavras-Chave #半导体材料
Tipo

期刊论文