SICL4 REACTIVE ION ETCHING FOR GAAS OPTICAL WAVE-GUIDES

Autoria(s): SONEK GJ; JIANZHONG L; WOLF ED; BALLANTYNE JM
Data(s)

1985
Identificador

http://ir.semi.ac.cn/handle/172111/14721

http://www.irgrid.ac.cn/handle/1471x/101395
Idioma(s)

英语
Fonte

SONEK GJ; JIANZHONG L; WOLF ED; BALLANTYNE JM.SICL4 REACTIVE ION ETCHING FOR GAAS OPTICAL WAVE-GUIDES,JOURNAL OF LIGHTWAVE TECHNOLOGY,1985,3(5):1147-1150
Palavras-Chave #半导体器件
Tipo

期刊论文
Acesso ao item digital