BEHAVIOR AND MAIN ORIGIN OF HEAT-INDUCED MICRODEFECTS AT THE SURFACE OF A SI WAFER

Autoria(s): ZHANG YX; CHENG MQ
Data(s)

1985
Identificador

http://ir.semi.ac.cn/handle/172111/14717

http://www.irgrid.ac.cn/handle/1471x/101393
Idioma(s)

英语
Fonte

ZHANG YX; CHENG MQ.BEHAVIOR AND MAIN ORIGIN OF HEAT-INDUCED MICRODEFECTS AT THE SURFACE OF A SI WAFER,CHINESE PHYSICS ,1985,5(4):1060-1064
Palavras-Chave #半导体物理
Tipo

期刊论文
Acesso ao item digital