CHANNELING ANALYSIS OF SELF-IMPLANTED AND RECRYSTALLIZED SILICON ON SAPPHIRE


Autoria(s): FAN RY; YU YH; YIN SD; LIN LY
Data(s)

1986

Identificador

http://ir.semi.ac.cn/handle/172111/14703

http://www.irgrid.ac.cn/handle/1471x/101386

Idioma(s)

英语

Fonte

FAN RY; YU YH; YIN SD; LIN LY.CHANNELING ANALYSIS OF SELF-IMPLANTED AND RECRYSTALLIZED SILICON ON SAPPHIRE,NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,1986,15(0):350-351

Palavras-Chave #半导体材料
Tipo

期刊论文