COMPUTER-SIMULATIONS OF THE ION-IMPLANTATION PROCESS IN LAYERED MATERIALS


Autoria(s): CUI FZ; LI HD; ZHANG JP
Data(s)

1987

Identificador

http://ir.semi.ac.cn/handle/172111/14653

http://www.irgrid.ac.cn/handle/1471x/101361

Idioma(s)

英语

Fonte

CUI FZ; LI HD; ZHANG JP.COMPUTER-SIMULATIONS OF THE ION-IMPLANTATION PROCESS IN LAYERED MATERIALS,NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,1987,21(0):478-479

Palavras-Chave #半导体物理
Tipo

期刊论文