FORMATION OF SILICIDES IN THE TI, TI(OX)/SI(111), AND TISIO2/SI(111) SYSTEMS
| Data(s) |
1987
|
|---|---|
| Identificador | |
| Idioma(s) |
英语 |
| Fonte |
HSU CC; WANG YX; YIN SD; LI BQ; JI MR; WU JX.FORMATION OF SILICIDES IN THE TI, TI(OX)/SI(111), AND TISIO2/SI(111) SYSTEMS,JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,1987,5(4):1402-1406 |
| Palavras-Chave | #半导体材料 |
| Tipo |
期刊论文 |
