CW ARGON-LASER-INDUCED ZONE-MELTING RECRYSTALLIZATION OF THIN SILICON ON OXIDE

Autoria(s): XU QX; RYSSEL H; GOTZLICH J; STEINBERGER H
Data(s)

1988
Identificador

http://ir.semi.ac.cn/handle/172111/14579

http://www.irgrid.ac.cn/handle/1471x/101324
Idioma(s)

英语
Fonte

XU QX; RYSSEL H; GOTZLICH J; STEINBERGER H.CW ARGON-LASER-INDUCED ZONE-MELTING RECRYSTALLIZATION OF THIN SILICON ON OXIDE,JOURNAL OF CRYSTAL GROWTH ,1988,88(3):383-390
Palavras-Chave #半导体材料
Tipo

期刊论文
Acesso ao item digital