COMPOSITION DEPTH PROFILES OF OXIDIZED SILICON AND SPUTTERED GAAS FROM ANGLE-RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY


Autoria(s): BUSSING TD; HOLLOWAY PH; WANG YX; MOULDER JF; HAMMOND JS
Data(s)

1988

Identificador

http://ir.semi.ac.cn/handle/172111/14547

http://www.irgrid.ac.cn/handle/1471x/101308

Idioma(s)

英语

Fonte

BUSSING TD; HOLLOWAY PH; WANG YX; MOULDER JF; HAMMOND JS.COMPOSITION DEPTH PROFILES OF OXIDIZED SILICON AND SPUTTERED GAAS FROM ANGLE-RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY,JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,1988,6(5):1514-1518

Palavras-Chave #半导体材料
Tipo

期刊论文