FORMATION OF TISI2 AND SHALLOW JUNCTION BY AS+ ION-BEAM MIXING AND INFRARED RAPID HEAT-TREATMENT


Autoria(s): MIN Y; LIN HW; TSIEN PH; ZHANG JP; YIN SD
Data(s)

1989

Identificador

http://ir.semi.ac.cn/handle/172111/14519

http://www.irgrid.ac.cn/handle/1471x/101294

Idioma(s)

英语

Fonte

MIN Y; LIN HW; TSIEN PH; ZHANG JP; YIN SD.FORMATION OF TISI2 AND SHALLOW JUNCTION BY AS+ ION-BEAM MIXING AND INFRARED RAPID HEAT-TREATMENT,IEEE TRANSACTIONS ON ELECTRON DEVICES,1989,36(3):514-521

Palavras-Chave #半导体器件
Tipo

期刊论文