FORMATION OF TISI2 AND SHALLOW JUNCTION BY AS+ ION-BEAM MIXING AND INFRARED RAPID HEAT-TREATMENT

Autoria(s): YE M; LIN HW; FEI GF; TSIEN PS; ZHANG JP; YIN SD
Data(s)

1989
Identificador

http://ir.semi.ac.cn/handle/172111/14503

http://www.irgrid.ac.cn/handle/1471x/101286
Idioma(s)

英语
Fonte

YE M; LIN HW; FEI GF; TSIEN PS; ZHANG JP; YIN SD.FORMATION OF TISI2 AND SHALLOW JUNCTION BY AS+ ION-BEAM MIXING AND INFRARED RAPID HEAT-TREATMENT,VACUUM ,1989,39(0):231-233
Palavras-Chave #半导体材料
Tipo

期刊论文
Acesso ao item digital