CHARACTERIZATION OF SILICON-ON-INSULATOR STRUCTURES PRODUCED BY NITROGEN ION-IMPLANTATION

Autoria(s): FAN TW; YUAN J; BROWN LM
Data(s)

1987
Identificador

http://ir.semi.ac.cn/handle/172111/14483

http://www.irgrid.ac.cn/handle/1471x/101276
Idioma(s)

英语
Fonte

FAN TW; YUAN J; BROWN LM.CHARACTERIZATION OF SILICON-ON-INSULATOR STRUCTURES PRODUCED BY NITROGEN ION-IMPLANTATION,INSTITUTE OF PHYSICS CONFERENCE SERIES,1987,(87):421-426
Palavras-Chave #半导体材料
Tipo

期刊论文
Acesso ao item digital