THE EFFECT OF THERMAL-TREATMENT ON THE THIN-FILM REACTION OF LA, CE, AND ND ON SILICON SURFACES
| Data(s) |
1989
|
|---|---|
| Identificador | |
| Idioma(s) |
英语 |
| Fonte |
HSU CC; WANG YX; HU J; HO J; QIAN JJ.THE EFFECT OF THERMAL-TREATMENT ON THE THIN-FILM REACTION OF LA, CE, AND ND ON SILICON SURFACES,JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,1989,7(5):3016-3022 |
| Palavras-Chave | #半导体材料 |
| Tipo |
期刊论文 |
