LANTHANUM SILICIDE FORMATION IN THIN LA-SI MULTILAYER FILMS

Autoria(s): HSU CC; HO J; QIAN JJ; WANG YT; WANG YX
Data(s)

1990
Identificador

http://ir.semi.ac.cn/handle/172111/14355

http://www.irgrid.ac.cn/handle/1471x/101212
Idioma(s)

英语
Fonte

HSU CC; HO J; QIAN JJ; WANG YT; WANG YX.LANTHANUM SILICIDE FORMATION IN THIN LA-SI MULTILAYER FILMS,VACUUM ,1990,41(0):1425-1427
Palavras-Chave #半导体材料
Tipo

期刊论文
Acesso ao item digital