CONVERGENT-BEAM ELECTRON-DIFFRACTION STUDY OF GE0.5SI0.5/SI STRAINED-LAYER SUPERLATTICES GROWN BY MOLECULAR-BEAM EPITAXY


Autoria(s): DUAN XF; FUNG KK; CHU YM; SHENG C; ZHOU GL
Data(s)

1991

Resumo

Side bands due to purely composition and combined composition-strain modulation in plan-view specimens of a nominally Ge0.5Si0.5(5nm)/Si(25nm) superlattice have been obtained by large-angle convergent-beam electron diffraction. The intensities of the side bands have been calculated from a periodic tension-compression model of the superlattice bilayer using the kinematical theory of electron diffraction. Accurate values of elastic strains in the bilayer and of the Ge content can be obtained in this way.

Identificador

http://ir.semi.ac.cn/handle/172111/14323

http://www.irgrid.ac.cn/handle/1471x/101196

Idioma(s)

英语

Fonte

DUAN XF; FUNG KK; CHU YM; SHENG C; ZHOU GL.CONVERGENT-BEAM ELECTRON-DIFFRACTION STUDY OF GE0.5SI0.5/SI STRAINED-LAYER SUPERLATTICES GROWN BY MOLECULAR-BEAM EPITAXY,PHILOSOPHICAL MAGAZINE LETTERS,1991,63(2):79-85

Palavras-Chave #半导体材料 #MULTILAYERS #HETEROSTRUCTURES
Tipo

期刊论文