BAND-OFFSET OF GAAS-GAINP HETEROJUNCTIONS


Autoria(s): FENG SL; KRYNICKI J; DONCHEV V; BOURGOIN JC; DIFORTEPOISSON M; BRYLINSKI C; DELAGE S; BLANCK H; ALAYA S
Data(s)

1993

Resumo

N+ GaAs-n GaInP lattice-matched heterostructures, grown by metalorganic vapour phase epitaxy, have been studied by capacitance-voltage, current-voltage and current-temperature techniques. This allowed the determination of the conduction band offset in three different and independent ways. The value obtained (0.24-0.25 eV) has been verified by photoluminescence and photoluminescence excitation on a 90 angstrom thick GaAs well in GaInP grown under the same conditions.

Identificador

http://ir.semi.ac.cn/handle/172111/14029

http://www.irgrid.ac.cn/handle/1471x/101049

Idioma(s)

英语

Fonte

FENG SL; KRYNICKI J; DONCHEV V; BOURGOIN JC; DIFORTEPOISSON M; BRYLINSKI C; DELAGE S; BLANCK H; ALAYA S.BAND-OFFSET OF GAAS-GAINP HETEROJUNCTIONS,SEMICONDUCTOR SCIENCE AND TECHNOLOGY,1993,8(12):2092-2096

Palavras-Chave #半导体物理 #CONDUCTION-BAND #PHASE EPITAXY #VALENCE #VOLTAGE
Tipo

期刊论文