HIGH-QUALITY INGAP AND INGAP/INALP MULTIPLE-QUANTUM-WELL GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXY


Autoria(s): YAN CH; SUN DZ; GUO HX; LI XB; ZU SR; HUANG YH; ZHENG YP; KONG MY
Data(s)

1994

Resumo

Using gas-source molecular beam epitaxy, we have obtained high-quality GaInP and (AlGa)InP epilayers lattice-matched to (100) GaAs substrates. All grown layers exhibited mirror-like surfaces. For a 1.7 mum thick Ga0.5In0.5P film, the Hall electron mobility was 3400 and 30,000 CM2/V. s at 300 and 77 K, respectively. The luminescence wavelength of (AlxGa1-x)InP samples ranged from 680 nm (for GaInP) to 590 nm (for AlInP) at room temperature, and from 644 to 513 nm at 77 K. The multiple quantum well (MQW) structure with well width of 40 angstrom showed strong luminescence intensity with wavelength of 647 nm (300 K) or 622 nm (80 K). The satellite peaks can be detected in double-crystal X-ray (DCXR) diffraction measurements of the MQW samples, which indicates the perfect structural periodicity.

Identificador

http://ir.semi.ac.cn/handle/172111/14007

http://www.irgrid.ac.cn/handle/1471x/101038

Idioma(s)

英语

Fonte

YAN CH; SUN DZ; GUO HX; LI XB; ZU SR; HUANG YH; ZHENG YP; KONG MY.HIGH-QUALITY INGAP AND INGAP/INALP MULTIPLE-QUANTUM-WELL GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXY,JOURNAL OF CRYSTAL GROWTH ,1994,136(0):306-309

Palavras-Chave #半导体材料 #DOUBLE-HETEROSTRUCTURE
Tipo

期刊论文