INFLUENCE OF THE 90-DEGREES PARTIAL DISLOCATION CORE STRUCTURE IN SILICON ON ENERGY-LEVELS


Autoria(s): MARKLUND S; WANG YL
Data(s)

1994

Resumo

An LCAO-scheme taking into account 10 atomic orbitals (s-, p-, and d-type) is used to calculate the electronic structure of the reconstructed 90-degrees partial dislocation in Si. Two different valence force fields producing deviating results are used for modelling the core structure. Geometrical data published by another group is also used. The aim is to explore the influence of geometry on energy levels. We find that the band structure depends sensitively on bond angles. Using data determined by the Tersoff potential we obtain two bands of which the upper one penetrates deeply into the indirect band gap while the geometry minimizing the simple Keating potential leaves the gap completely clear of dislocation states. Thus, from a theoretical point of view, the chief difficulty in calculating the electronic structure of the reconstructed 90-degrees partial is the lack of accurate structural information.

Identificador

http://ir.semi.ac.cn/handle/172111/13989

http://www.irgrid.ac.cn/handle/1471x/101029

Idioma(s)

英语

Fonte

MARKLUND S; WANG YL.INFLUENCE OF THE 90-DEGREES PARTIAL DISLOCATION CORE STRUCTURE IN SILICON ON ENERGY-LEVELS,SOLID STATE COMMUNICATIONS ,1994,91(4):301-305

Palavras-Chave #半导体材料 #ELECTRON-STATES #DEFECTS
Tipo

期刊论文