ESTIMATION OF THE STRAIN STATE OF GEXSI1-X/SI STRAINED-LAYER SUPERLATTICES BY DOUBLE-CRYSTAL X-RAY-DIFFRACTION


Autoria(s): DUAN XF; FUNG KK; CHU YM
Data(s)

1994

Resumo

20-period strained-layer superlattices of nominal composition and width Ge0.2Si0.8 (5 nm)/Si(25 nm) and Ge0.5Si0.5 (5 nm)/Si(25 nm) were studied by double-crystal X-ray diffraction. The Ge content x was determined by computer simulation of the diffraction features from the superlattice. This method is shown to be independent of the relaxation of the superlattice. Alternatively, x can be obtained from the measured difference DELTAa/a in lattice spacing perpendicular to the growth plane. It is sensitive to the relaxation. Comparing the results obtained in these two different ways, information about the relaxation of the superlattices can be obtained.

Identificador

http://ir.semi.ac.cn/handle/172111/13987

http://www.irgrid.ac.cn/handle/1471x/101028

Idioma(s)

英语

Fonte

DUAN XF; FUNG KK; CHU YM.ESTIMATION OF THE STRAIN STATE OF GEXSI1-X/SI STRAINED-LAYER SUPERLATTICES BY DOUBLE-CRYSTAL X-RAY-DIFFRACTION,JOURNAL OF CRYSTAL GROWTH,1994,141(0):103-108

Palavras-Chave #半导体物理 #BEAM ELECTRON-DIFFRACTION #EPITAXIAL LAYERS
Tipo

期刊论文