INVESTIGATION OF POROUS SILICON BY SCANNING-TUNNELING-MICROSCOPY AND ATOMIC-FORCE MICROSCOPY


Autoria(s): YU T; LAIHO R; HEIKKILA L
Data(s)

1994

Resumo

The size and distribution of surface features of porous silicon layers have been investigated by scanning tunneling and atomic force microscopy. Pores and hillocks down to 1-2 nm size were observed, with their shape and distribution on the sample surface being influenced by crystallographic effects. The local density of electronic states show a strong increase above 2 eV, in agreement with recent theoretical predictions.

Identificador

http://ir.semi.ac.cn/handle/172111/13975

http://www.irgrid.ac.cn/handle/1471x/101022

Idioma(s)

英语

Fonte

YU T; LAIHO R; HEIKKILA L.INVESTIGATION OF POROUS SILICON BY SCANNING-TUNNELING-MICROSCOPY AND ATOMIC-FORCE MICROSCOPY,JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,1994,12(4):2437-2439

Palavras-Chave #半导体材料 #PHOTOLUMINESCENCE #SPECTROSCOPY #WAFERS
Tipo

期刊论文