Mechanical stress in 355 nm LaF3/MgF2 high reflectors with various layer-pair number and methods for reduction
| Data(s) |
2010
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|---|---|
| Identificador | |
| Idioma(s) |
中文 |
| Fonte |
Guang-hui Liu, Qi-ling Xiao, Yun-xia Jin, Wei-li Zhang, Hong-bo He, Zheng-xiu Fan.Mechanical stress in 355 nm LaF3/MgF2 high reflectors with various layer-pair number and methods for reduction.Vacuum,2010,84: |
| Palavras-Chave | #光学材料 |
| Tipo |
期刊论文 |
