Damage characteristics of HfO2/SiO2 high re°ector at 45 incidence in 1-on-1 and N-on-1 tests

Autoria(s): Xiaofeng Liu; Dawei Li; Yuan'an Zhao; Xiao Li; Xiulan Ling; Jianda Shao
Data(s)

2010
Identificador

http://ir.siom.ac.cn/handle/181231/7186

http://www.irgrid.ac.cn/handle/1471x/87050
Idioma(s)

中文
Fonte

Xiaofeng Liu,Dawei Li,Yuan'an Zhao,Xiao Li,Xiulan Ling,Jianda Shao.Damage characteristics of HfO2/SiO2 high re°ector at 45 incidence in 1-on-1 and N-on-1 tests.CHINESE OPTICS LETTERS,2010,1:41
Palavras-Chave #激光技术
Tipo

期刊论文
Acesso ao item digital