A study of indium incorporation in In-rich InGaN grown by MOVPE


Autoria(s): Guo Y; Liu XL; Song HP; Yang AL; Xu XQ; Zheng GL; Wei HY; Yang SY; Zhu QS; Wang ZG
Data(s)

2010

Resumo

InGaN/GaN heterostructures have been deposited onto (0 0 0 1) sapphire by our home-made low pressure MOVPE with different growth parameters. It has been noted that the indium incorporation depends by a complex way on a number of factors. In this work, the effect of substrate temperature, trimethylindium input flow and V/III ratio on the indium incorporation has been investigated. Finally, by optimizing the growth parameters, we made a series of single-phase InGaN samples with indium content from 10% up to 45%.

Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-04-22T13:28:22Z No. of bitstreams: 1 A study of indium incorporation in In-rich InGaN grown by MOVPE.pdf: 513757 bytes, checksum: f9da299fd03c529e1314ef47bfe6ba61 (MD5)

Approved for entry into archive by 阎军(yanj@red.semi.ac.cn) on 2010-04-22T13:39:08Z (GMT) No. of bitstreams: 1 A study of indium incorporation in In-rich InGaN grown by MOVPE.pdf: 513757 bytes, checksum: f9da299fd03c529e1314ef47bfe6ba61 (MD5)

Made available in DSpace on 2010-04-22T13:39:08Z (GMT). No. of bitstreams: 1 A study of indium incorporation in In-rich InGaN grown by MOVPE.pdf: 513757 bytes, checksum: f9da299fd03c529e1314ef47bfe6ba61 (MD5) Previous issue date: 2010

National Science Foundation of China 60776015 60976008 ;Major State Basic Research Project of China 2006CB604907; 863 High Technology R& D Program of China 2007AA03Z402 2007AA03Z451

其它

National Science Foundation of China 60776015 60976008 ;Major State Basic Research Project of China 2006CB604907; 863 High Technology R& D Program of China 2007AA03Z402 2007AA03Z451

Identificador

http://ir.semi.ac.cn/handle/172111/11182

http://www.irgrid.ac.cn/handle/1471x/66217

Idioma(s)

英语

Fonte

Guo Y, Liu XL, Song HP, Yang AL, Xu XQ, Zheng GL, Wei HY, Yang SY, Zhu QS, Wang ZG.A study of indium incorporation in In-rich InGaN grown by MOVPE.APPLIED SURFACE SCIENCE,2010,256(10):3352-3356

Palavras-Chave #半导体材料 #MOVPE #In-rich InGaN #Indium incorporation #MOLECULAR-BEAM EPITAXY #CHEMICAL-VAPOR-DEPOSITION #CRITICAL THICKNESS #DROPLET FORMATION #PHASE-SEPARATION #TEMPERATURE #FILMS #HETEROSTRUCTURES #IMMISCIBILITY #INXGA1-XN
Tipo

期刊论文