Effects of annealing treatment on the formation of CO2 in ZnO thin films grown by metal-organic chemical vapor deposition


Autoria(s): Zheng GL; Yang AL; Wei HY; Liu XL; Song HP; Guo; Y; Jia CH; Jiao CM; Yang SY; Zhu QS; Wang ZG
Data(s)

2010

Resumo

Post-growth annealing was carried out on ZnO thin films grown by metal-organic chemical vapor deposition (MOCVD). The grain size of ZnO thin film increases monotonically with annealing temperature. The ZnO thin films were preferential to c-axis oriented after annealing as confirmed by Xray diffraction (XRD) measurements. Fourier transformation infrared transmission measurements showed that ZnO films grown at low temperature contains CO2 molecules after post-growth annealing. A two-step reaction process has been proposed to explain the formation mechanism of CO2, which indicates the possible chemical reaction processes during the metal-organic chemical vapor deposition of ZnO films.

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National Science Foundation of China 60776015 60976008; Special Funds for Major State Basic Research Project (973 program) of China 2006CB604907; 863 High Technology R&D Program of China 2007AA03Z402 2007AA03Z451

其它

National Science Foundation of China 60776015 60976008; Special Funds for Major State Basic Research Project (973 program) of China 2006CB604907; 863 High Technology R&D Program of China 2007AA03Z402 2007AA03Z451

Identificador

http://ir.semi.ac.cn/handle/172111/10206

http://www.irgrid.ac.cn/handle/1471x/66206

Idioma(s)

英语

Fonte

Zheng GL, Yang AL, Wei HY, Liu XL, Song HP, Guo, Y, Jia CH, Jiao CM, Yang SY, Zhu QS, Wang ZG.Effects of annealing treatment on the formation of CO2 in ZnO thin films grown by metal-organic chemical vapor deposition.APPLIED SURFACE SCIENCE,2010,256(8):2606-2610

Palavras-Chave #半导体材料 #ZnO #Metal-organic chemical vapor deposition #Infrared absorption #Surface #RAY PHOTOELECTRON-SPECTROSCOPY #POLAR-SURFACE #EPITAXY
Tipo

期刊论文