Donor defect in P-diffused bulk ZnO single crystal


Autoria(s): Zhao YW (Zhao Youwen); Zhang R (Zhang Rui); Zhang F (Zhang Fan); Dong ZY (Dong Zhiyuan); Yang J (Yang Jun)
Data(s)

11/10/2010

Resumo

A high concentration of shallow donor defect is formed in P-diffused ZnO single crystals. X-ray photoelectron spectroscopy analysis indicates that P atom occupy different lattice site at different diffusion temperature. Nature of the donor defect has been discussed.

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Approved for entry into archive by 阎军(yanj@red.semi.ac.cn) on 2010-10-11T07:33:19Z (GMT) No. of bitstreams: 1 Donor defect in P-diffused bulk ZnO single crystal.pdf: 328954 bytes, checksum: c08258735f4ce99e567f69a9c2b8a868 (MD5)

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其它

Identificador

http://ir.semi.ac.cn/handle/172111/13554

http://www.irgrid.ac.cn/handle/1471x/66120

Idioma(s)

英语

Fonte

Zhao YW (Zhao Youwen), Zhang R (Zhang Rui), Zhang F (Zhang Fan), Dong ZY (Dong Zhiyuan), Yang J (Yang Jun).Donor defect in P-diffused bulk ZnO single crystal.见:29th International Conference on Physics of Semiconductors.Rio de Janeiro, BRAZIL.2009.

Palavras-Chave #半导体材料 #Zinc Oxide #doping #defect
Tipo

会议论文