Variation of Optical Quenching of Photoconductivity with Resistivity in Unintentional Doped GaN


Autoria(s): Hou QF (Hou Qi-Feng); Wang XL (Wang Xiao-Liang); Xiao; HL (Xiao Hong-Ling); Wang CM (Wang Cui-Mei); Yang CB (Yang Cui-Bai); Li JM (Li Jin-Min)
Data(s)

2010

Resumo

The optical quenching of photoconductivity under dual illumination in GaN samples with different resistivity is investigated to reveal the variation of deep levels. The samples are grown by metal organic chemical vapour deposition without intentional doping. Quenching bands centered at 1.35 eV, 1.55 eV, 1.98 eV, and 2.60 eV are observed. It is found that the 1.98 eV quenching band is dominated in all the samples and the 2.60 eV band is observed only in the high-resistivity samples. The possible defect levels responsible for the quenching bands and the origin of different quenching behaviour at 2.60 eV are discussed. It is suggested that the defect level responsible for quenching at 2.60 eV plays an important role for the enhancement of resistivity.

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Chinese Academy of Sciences YYYJ-0701-02 IS-CAS2008T01 ISCAS2009L01 ISCAS2009L02

其它

Chinese Academy of Sciences YYYJ-0701-02 IS-CAS2008T01 ISCAS2009L01 ISCAS2009L02

Identificador

http://ir.semi.ac.cn/handle/172111/11237

http://www.irgrid.ac.cn/handle/1471x/66116

Idioma(s)

英语

Fonte

Hou QF (Hou Qi-Feng), Wang XL (Wang Xiao-Liang), Xiao, HL (Xiao Hong-Ling), Wang CM (Wang Cui-Mei), Yang CB (Yang Cui-Bai), Li JM (Li Jin-Min).Variation of Optical Quenching of Photoconductivity with Resistivity in Unintentional Doped GaN.CHINESE PHYSICS LETTERS,2010,27(5):Art. No. 057104

Palavras-Chave #半导体材料 #N-TYPE GAN #DEEP LEVELS #SELENIDE #DEFECTS
Tipo

期刊论文