Structural and magnetic properties of GaN:Sm:Eu films fabricated by co-implantation method
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2010
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Resumo |
Diluted-magnetic GaN:Sm:Eu films have been fabricated by co-implantation of Sm and Eu ions into c-plane (0001) GaN films and a subsequent annealing process. The structural, morphological and magnetic characteristics of the samples have been investigated by means of high-resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM), and superconducting quantum interference device (SQUID). The XRD and AFM analyses show that the annealing process can effectively recover the crystalline degradation caused by implantation. Compared with GaN:Sm films, more defects have been introduced into GaN:Sm:Eu films due to the Eu implantation process. According to the SQUID analysis, GaN:Sm:Eu films exhibit clear room-temperature ferromagnetism. Moreover, GaN:Sm:Eu films show a lower saturation magnetization (Ms) than GaN:Sm films. Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-05-07T13:42:15Z No. of bitstreams: 1 Structural and magnetic properties of GaNSmEu films fabricated by co-implantation method.pdf: 517986 bytes, checksum: e16ef0f3d25bfce3da4b6bb551a3eda4 (MD5) Approved for entry into archive by 阎军(yanj@red.semi.ac.cn) on 2010-05-07T13:42:49Z (GMT) No. of bitstreams: 1 Structural and magnetic properties of GaNSmEu films fabricated by co-implantation method.pdf: 517986 bytes, checksum: e16ef0f3d25bfce3da4b6bb551a3eda4 (MD5) Made available in DSpace on 2010-05-07T13:42:49Z (GMT). No. of bitstreams: 1 Structural and magnetic properties of GaNSmEu films fabricated by co-implantation method.pdf: 517986 bytes, checksum: e16ef0f3d25bfce3da4b6bb551a3eda4 (MD5) Previous issue date: 2010 Natural Science Foundation of China 60876004 其它 Natural Science Foundation of China 60876004 |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Sun LL (Sun Lili), Liu C (Liu Chao), Li JM (Li Jianming), Wang JX (Wang Junxi), Yan FW (Yan Fawang), Zeng YP (Zeng Yiping), Li JM (Li Jinmin).Structural and magnetic properties of GaN:Sm:Eu films fabricated by co-implantation method. MATERIALS LETTERS,2010,64(9):1031-1033 |
Palavras-Chave | #半导体材料 #Magnetic materials #Semiconductors #Ion implantation |
Tipo |
期刊论文 |