Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach
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2010
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Resumo |
We present the fabrication process and experimental results of 850-nm oxide-confined vertical cavity surface emitting lasers (VCSELs) fabricated by using dielectric-free approach. The threshold current of 0.4 mA, which corresponds to the threshold current density of 0.5 kA/cm(2), differential resistance of 76 Omega, and maximum output power of more than 5 mW are achieved for the dielectric-free VCSEL with a square oxide aperture size of 9 mu m at room temperature (RT). L-I-V characteristics of the dielectric-free VCSEL are compared with those of conventional VCSEL with the similar aperture size, which indicates the way to realize low-cost, low-power consumption VCSELs with extremely simple process. Preliminary study of the temperature-dependent L-I characteristics and modulation response of the dielectric-free VCSEL are also presented. Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-04-22T12:45:06Z No. of bitstreams: 1 Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach.pdf: 817739 bytes, checksum: 816d1e16ed36bee969a4897ac984b2c6 (MD5) Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-04-22T12:45:06Z No. of bitstreams: 1 Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach.pdf: 817739 bytes, checksum: 816d1e16ed36bee969a4897ac984b2c6 (MD5) 国际 |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Ding Y, Fan WJ, Xu DW, Tong CZ, Liu Y, Zhao LJ.Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach.APPLIED PHYSICS B-LASERS AND OPTICS, 98 (4): 773-778 Sp. Iss. SI MAR 2010,2010,98(4):773-778 Sp. Iss. |
Palavras-Chave | #光电子学 #SURFACE-EMITTING LASERS |
Tipo |
期刊论文 |