Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach


Autoria(s): Ding Y; Fan WJ; Xu DW; Tong CZ; Liu Y; Zhao LJ
Data(s)

2010

Resumo

We present the fabrication process and experimental results of 850-nm oxide-confined vertical cavity surface emitting lasers (VCSELs) fabricated by using dielectric-free approach. The threshold current of 0.4 mA, which corresponds to the threshold current density of 0.5 kA/cm(2), differential resistance of 76 Omega, and maximum output power of more than 5 mW are achieved for the dielectric-free VCSEL with a square oxide aperture size of 9 mu m at room temperature (RT). L-I-V characteristics of the dielectric-free VCSEL are compared with those of conventional VCSEL with the similar aperture size, which indicates the way to realize low-cost, low-power consumption VCSELs with extremely simple process. Preliminary study of the temperature-dependent L-I characteristics and modulation response of the dielectric-free VCSEL are also presented.

Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-04-22T12:45:06Z No. of bitstreams: 1 Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach.pdf: 817739 bytes, checksum: 816d1e16ed36bee969a4897ac984b2c6 (MD5)

Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-04-22T12:45:06Z No. of bitstreams: 1 Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach.pdf: 817739 bytes, checksum: 816d1e16ed36bee969a4897ac984b2c6 (MD5)

国际

Identificador

http://ir.semi.ac.cn/handle/172111/11175

http://www.irgrid.ac.cn/handle/1471x/66094

Idioma(s)

英语

Fonte

Ding Y, Fan WJ, Xu DW, Tong CZ, Liu Y, Zhao LJ.Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach.APPLIED PHYSICS B-LASERS AND OPTICS, 98 (4): 773-778 Sp. Iss. SI MAR 2010,2010,98(4):773-778 Sp. Iss.

Palavras-Chave #光电子学 #SURFACE-EMITTING LASERS
Tipo

期刊论文