Fabrication and characterization of two-dimensional photonic crystal on silicon by efficient methods
| Data(s) |
2006
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|---|---|
| Resumo |
Two-dimensional photonic crystals working in near infrared region are fabricated into silicon-on-insulator wafer by 248-nm deep UV lithography. We present an efficient way to measure the photonic crystal waveguide's light transmission spectra at given polarization states. Two-dimensional photonic crystals working in near infrared region are fabricated into silicon-on-insulator wafer by 248-nm deep UV lithography. We present an efficient way to measure the photonic crystal waveguide's light transmission spectra at given polarization states. zhangdi于2010-03-29批量导入 zhangdi于2010-03-29批量导入 IEEE. Chinese Acad Sci, State Key Lab Integrated Optoelect, Inst Semicond, Beijing 100083, Peoples R China IEEE. |
| Identificador | |
| Idioma(s) |
英语 |
| Publicador |
IEEE 345 E 47TH ST, NEW YORK, NY 10017 USA |
| Fonte |
Xu, XS (Xu, Xingsheng); Wang, CX (Wang, Chunxia); Li, F (Li, Fang); Xiong, GG (Xiong, Guiguang); Liu, YL (Liu, Yuliang); Chen, HD (Chen, Hongda) .Fabrication and characterization of two-dimensional photonic crystal on silicon by efficient methods .见：IEEE .2006 3rd IEEE International Conference on Group IV Photonics,345 E 47TH ST, NEW YORK, NY 10017 USA ,2006,69-71 |
| Palavras-Chave | #光电子学 #WAVE-GUIDE |
| Tipo |
会议论文 |
