单层金属工艺条件下高密度布线设计


Autoria(s): 庄文军; 高春华; 程可行; 牛征虎; 刘新平
Data(s)

1988

Resumo

于G批量导入至Hzhangdi

Made available in DSpace on 2010-04-13T00:43:35Z (GMT). No. of bitstreams: 0 Previous issue date: 1988

Identificador

http://ir.semi.ac.cn/handle/172111/10980

http://www.irgrid.ac.cn/handle/1471x/65698

Idioma(s)

中文

Fonte

庄文军;高春华;程可行;牛征虎;刘新平.单层金属工艺条件下高密度布线设计 .1988

Palavras-Chave #半导体器件
Tipo

成果