Study of Si/SiO2 hybrid antireflective coatings on SLD prepared by DSEBET - art. no. 69842P


Autoria(s): Sun, MX; Tan, MQ; Zhao, M
Data(s)

2008

Resumo

We introduce a double source electron beam evaporation (DSEBET) technique in this paper. The refractive index coatings were fabricated on K9 glass substrate by adjusting the evaporation rates of two independent sources. The coatings, which were described by atomic force microscopy (AFM), show good compactness and homogeneity. The antireflective (AR) coatings were fabricated on Superluminescent Diodes (SLD) by DSEBET. The hybrid AR coatings on the facets of SLD were prepared in evaporation rates of 0.22nm/s and 0.75nm/s for silicon and silicon dioxide, respectively. The results of AFM and spectral performance of coated SLD show that DSEBET has a promising future in preparing the coatings on optoelectronic devices.

We introduce a double source electron beam evaporation (DSEBET) technique in this paper. The refractive index coatings were fabricated on K9 glass substrate by adjusting the evaporation rates of two independent sources. The coatings, which were described by atomic force microscopy (AFM), show good compactness and homogeneity. The antireflective (AR) coatings were fabricated on Superluminescent Diodes (SLD) by DSEBET. The hybrid AR coatings on the facets of SLD were prepared in evaporation rates of 0.22nm/s and 0.75nm/s for silicon and silicon dioxide, respectively. The results of AFM and spectral performance of coated SLD show that DSEBET has a promising future in preparing the coatings on optoelectronic devices.

zhangdi于2010-03-09批量导入

Made available in DSpace on 2010-03-09T02:11:53Z (GMT). No. of bitstreams: 1 672.pdf: 333946 bytes, checksum: c5513a59f6a14fe768175e8318e9ae9a (MD5) Previous issue date: 2008

Shanghai Jiao Tong Univ, Dept Phys.; Natl Nat Sci Fdn China.; Chinese Phys Soc.; Shanghai Phys Soc.; SPIE.

[Sun, M. X.; Tan, M. Q.; Zhao, M.] Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China

Shanghai Jiao Tong Univ, Dept Phys.; Natl Nat Sci Fdn China.; Chinese Phys Soc.; Shanghai Phys Soc.; SPIE.

Identificador

http://ir.semi.ac.cn/handle/172111/7786

http://www.irgrid.ac.cn/handle/1471x/65685

Idioma(s)

英语

Publicador

SPIE-INT SOC OPTICAL ENGINEERING

1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA

Fonte

Sun, MX ; Tan, MQ ; Zhao, M .Study of Si/SiO2 hybrid antireflective coatings on SLD prepared by DSEBET - art. no. 69842P .见:SPIE-INT SOC OPTICAL ENGINEERING .THIN FILM PHYSICS AND APPLICATIONS,SIXTH INTERNATIONAL CONFERENCE,1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA ,2008,6984: P9842-P9842

Palavras-Chave #光电子学 #antireflective coatings #superluminescent diodes #double source electron beam evaporation technology
Tipo

会议论文