Observation of defects in GaN epilayers


Autoria(s): Kang JY; Liu XL; Ogawa T
Data(s)

1998

Resumo

GaN epilayers grown on sapphire substrates nitridated for various lengthy periods were investigated by light scattering tomography (LST) and Raman scattering. In the LST images of the plane-view epilayers, the light scattering defects distribute in [<11(2)over bar 0>] directions. The defect density is lower in epilayer grown on substrate nitridated for a longer period. The defects are believed to be straight threading edge dislocations on {<1(1)over bar 00>} planes. The Raman shift of E-2 mode is larger in the sample grown on substrate nitridated for a longer period. Our results show that the stress is higher in the sample with fewer dislocations.

Identificador

http://ir.semi.ac.cn/handle/172111/13208

http://www.irgrid.ac.cn/handle/1471x/65574

Idioma(s)

英语

Fonte

Kang JY; Liu XL; Ogawa T .Observation of defects in GaN epilayers ,DEFECT RECOGNITION AND IMAGE PROCESSING IN SEMICONDUCTORS 1997,1998,160(0):347-350

Palavras-Chave #半导体物理 #SCATTERING #SAPPHIRE #GROWTH
Tipo

期刊论文