Gallium diffusion through cubic GaN films grown on GaAs(100) at high-temperature using low-pressure MOVPE


Autoria(s): Xu DP; Yang H; Zheng LX; Wang XJ; Duan LH; Wu RH
Data(s)

1998

Resumo

Cubic GaN films were grown on GaAs(1 0 0) substrates by low-pressure metalorganic vapor-phase epitaxy at high temperature. We have found a nonlinear relation between GaN film thickness and growth timer and this nonlinearity becomes more obvious with increasing growth temperature. We assumed it was because of Ga diffusion through the GaN film, and developed a model which agrees well with the experimental results. These results raise questions concerning the role of Ga diffusion through the GaN film, which may affect the electrical and optical properties of the material. (C) 1998 Published by Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/13124

http://www.irgrid.ac.cn/handle/1471x/65532

Idioma(s)

英语

Fonte

Xu DP; Yang H; Zheng LX; Wang XJ; Duan LH; Wu RH .Gallium diffusion through cubic GaN films grown on GaAs(100) at high-temperature using low-pressure MOVPE ,JOURNAL OF CRYSTAL GROWTH ,1998,191(4):646-650

Palavras-Chave #半导体材料 #MOLECULAR-BEAM EPITAXY #GAAS #NITRIDATION
Tipo

期刊论文