Transmission electron microscopy study of triple-ribbon contrast features in a ZnTe epitaxial layer


Autoria(s): Han PD
Data(s)

1998

Resumo

A transmission electron microscopy study of triple-ribbon contrast features in a ZnTe layer grown epitaxially on a vicinal GaAs (001) substrate is reported. The ribbons go through the layer as threading dislocations near the [<(11)over bar 2>](111) or [112](<(11)over bar 1>) directions. Each of these (with a 40 nm width) has two narrow parts enclosed by three partial dislocations (with a 20 nm spacing). By contrast analysis and contrast simulation, the ribbons have been shown to be composed of two partially overlapping stacking faults. Their origin is attributed to a forced reaction between two crossing perfect misfit dislocations.

Identificador

http://ir.semi.ac.cn/handle/172111/13120

http://www.irgrid.ac.cn/handle/1471x/65530

Idioma(s)

英语

Fonte

Han PD .Transmission electron microscopy study of triple-ribbon contrast features in a ZnTe epitaxial layer ,PHILOSOPHICAL MAGAZINE LETTERS,1998,78(3):203-211

Palavras-Chave #半导体物理 #THREADING DISLOCATION DENSITIES #II-VI COMPOUNDS #MISFIT DISLOCATIONS #SEMICONDUCTORS #ORIGIN #FILMS
Tipo

期刊论文