Formation mechanism of electric field domains
Data(s) |
1998
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Resumo |
Hydrostatic pressure measurements are used to investigate the formation mechanism of electric field domains in doped weakly-coupled GaAs/AlAs superlattices. For the first plateau-like region in the I-V curve, two kinds of sequential resonant tunnelling are observed. For P<2 kbar the high-field domain is formed by the Gamma-Gamma process, while for P>2 kbar the high-field domain is formed by the T-X process. For the second plateau-libe region, the high-field domain is attributed to Gamma-X sequential resonant tunnelling. (C) 1998 Elsevier Science B.V. All rights reserved. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Sun BQ; Liu ZX; Jiang DS .Formation mechanism of electric field domains ,MICROELECTRONIC ENGINEERING ,1998,15797(0):733-737 |
Palavras-Chave | #光电子学 #electric field domains #Gamma-Gamma resonant tunnelling #Gamma-X resonant tunnelling |
Tipo |
期刊论文 |