Formation mechanism of electric field domains


Autoria(s): Sun BQ; Liu ZX; Jiang DS
Data(s)

1998

Resumo

Hydrostatic pressure measurements are used to investigate the formation mechanism of electric field domains in doped weakly-coupled GaAs/AlAs superlattices. For the first plateau-like region in the I-V curve, two kinds of sequential resonant tunnelling are observed. For P<2 kbar the high-field domain is formed by the Gamma-Gamma process, while for P>2 kbar the high-field domain is formed by the T-X process. For the second plateau-libe region, the high-field domain is attributed to Gamma-X sequential resonant tunnelling. (C) 1998 Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/13106

http://www.irgrid.ac.cn/handle/1471x/65523

Idioma(s)

英语

Fonte

Sun BQ; Liu ZX; Jiang DS .Formation mechanism of electric field domains ,MICROELECTRONIC ENGINEERING ,1998,15797(0):733-737

Palavras-Chave #光电子学 #electric field domains #Gamma-Gamma resonant tunnelling #Gamma-X resonant tunnelling
Tipo

期刊论文